. .
Deutsch
Deutschland
Anmelden
Tipp von eurobuch.de
Ähnliche Bücher
Weitere, andere Bücher, die diesem Buch sehr ähnlich sein könnten:
Buch verkaufen
Anbieter, die das Buch mit der ISBN 9783838389455 ankaufen:
Suchtools
Buchtipps
Aktuelles
Werbung
FILTER
- 0 Ergebnisse
Kleinster Preis: 51,99 €, größter Preis: 68,82 €, Mittelwert: 59,56 €
Shallow tempering of materials - Mehboob Sadiq
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Mehboob Sadiq:
Shallow tempering of materials - neues Buch

2010, ISBN: 9783838389455

ID: 701260683

This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation. Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE Bücher > Fremdsprachige Bücher > Englische Bücher Taschenbuch 30.07.2010 Buch (fremdspr.), LAP Lambert Academic Publishing, .201

Neues Buch Buch.ch
No. 23403848 Versandkosten:zzgl. Versandkosten
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.
Shallow tempering of materials - Mehboob Sadiq
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Mehboob Sadiq:
Shallow tempering of materials - neues Buch

ISBN: 9783838389455

ID: 931303cf9767cd292da974e566c7789c

Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation. Bücher / Fremdsprachige Bücher / Englische Bücher 978-3-8383-8945-5, LAP Lambert Academic Publishing

Neues Buch Buch.de
Nr. 23403848 Versandkosten:Bücher und alle Bestellungen die ein Buch enthalten sind versandkostenfrei, sonstige Bestellungen innerhalb Deutschland EUR 3,-, ab EUR 20,- kostenlos, Bürobedarf EUR 4,50, kostenlos ab EUR 45,-, Sofort lieferbar, DE. (EUR 0.00)
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.
Shallow tempering of materials - Mehboob Sadiq
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Mehboob Sadiq:
Shallow tempering of materials - neues Buch

ISBN: 9783838389455

ID: 697302106

This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation. Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE Buch (fremdspr.) Bücher>Fremdsprachige Bücher>Englische Bücher, LAP Lambert Academic Publishing

Neues Buch Thalia.at
No. 23403848 Versandkosten:US (EUR 8.00)
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.
Shallow tempering of materials - Mehboob Sadiq
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Mehboob Sadiq:
Shallow tempering of materials - neues Buch

ISBN: 9783838389455

ID: 104895224

This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation. Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE Buch (fremdspr.) Bücher>Fremdsprachige Bücher>Englische Bücher, LAP Lambert Acad. Publ.

Neues Buch Thalia.de
No. 23403848 Versandkosten:, Versandfertig in 2 - 3 Tagen, DE (EUR 0.00)
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.
Shallow tempering of materials - Sadiq, Mehboob
Vergriffenes Buch, derzeit bei uns nicht verfügbar.
(*)
Sadiq, Mehboob:
Shallow tempering of materials - Taschenbuch

2010, ISBN: 383838945X

Gebundene Ausgabe, ID: 8575617

Applications of pulsed plasma streams from a plasma focus device for surface modification of Al, Si and PTFE - Buch, gebundene Ausgabe, 140 S., Beilagen: Paperback, Erschienen: 2010 LAP Lambert Acad. Publ.

Neues Buch Buch24.de
buch24de
Versandkosten:zzgl. Versandkosten
Details...
(*) Derzeit vergriffen bedeutet, dass dieser Titel momentan auf keiner der angeschlossenen Plattform verfügbar ist.

Details zum Buch
Shallow tempering of materials

This work evaluates the performance of a Mather type plasma focus device in connection with its use as a surface modification tool. It is shown that the device can be used for surface modification of different classes of solids (aluminium, silicon and PTFE). The surface hardening of aluminium is achieved through nitrogen ion implantation. The surface hardness of the ion implanted specimens is found to improve by 300 % by the formation of cubic aluminium nitride phase. Argon and nitrogen ion implantation are used to achieve amorphization of the crystalline silicon. Additionally, the device is employed to deposit thin films of aluminium nitride on silicon substrates. The films are observed to have a strong c-axis alignment but under compressive stress. The crystallinity of the PTFE is found to be enhanced under the action of nitrogen ion irradiation.

Detailangaben zum Buch - Shallow tempering of materials


EAN (ISBN-13): 9783838389455
ISBN (ISBN-10): 383838945X
Gebundene Ausgabe
Taschenbuch
Erscheinungsjahr: 2010
Herausgeber: LAP Lambert Acad. Publ.
140 Seiten
Gewicht: 0,225 kg
Sprache: eng/Englisch

Buch in der Datenbank seit 15.11.2009 18:24:07
Buch zuletzt gefunden am 02.06.2017 23:30:23
ISBN/EAN: 9783838389455

ISBN - alternative Schreibweisen:
3-8383-8945-X, 978-3-8383-8945-5


< zum Archiv...
Benachbarte Bücher